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ISO 21859:2019

ISO 21859:2019 Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

standard by International Organization for Standardization, 07/01/2019

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ISO 21859:2019 specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

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Edition: 1st Published: 07/01/2019 Number of Pages: 10 File Size: 1 file , 1.1 MB

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